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Beam injection assessment of microstructures in semiconductors BIAMS 2000 : proceedings of the 6th International Workshop on Beam Injection Assessment of Mictrostructures in Semiconductors held in Fukuoka, Japan, November 12-16, 2000 by International Workshop on Beam Injection Assessment of Microstructures in Semiconductors (6th 2000 Fukuoka, Japan)

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Published by Scitec Publications in Uetikon-Zuerich, Switzerland .
Written in English

Subjects:

  • Semiconductors -- Testing -- Congresses.,
  • Semiconductors -- Microscopy -- Congresses.,
  • Semiconductors -- Defects -- Congresses.

Book details:

Edition Notes

Includes bibliographical references and index.

Statementeditors: Hajime Tomokage and Takashi Sekiguchi.
GenreCongresses.
SeriesDiffusion and defect data--solid state data., Pt. B, Solid state phenomena,, v. 78-79, Diffusion and defect data., v. 78-79.
Classifications
LC ClassificationsTK7871.85 .I584365 2001
The Physical Object
Paginationxiii, 441 p. :
Number of Pages441
ID Numbers
Open LibraryOL3970668M
ISBN 103908450616
LC Control Number2001277780
OCLC/WorldCa47095956

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A. Minj; D. Cavalcoli; A. Cavallini, Conduction Mechanisms in AlInN/AlN/GaN investigated at the nanoscale, in: Book of Abstract of the 10th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors - BIAMS , s.l, s.n, , pp. 2 - 3 (atti di: 10th International Workshop on Beam Injection Assessment of.   The 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors, June 11–14, , St. Petersburg, Russia. AFM examination of nanolayers synthesised by the molecular layering method on the surface of manufacturing glasses.   The 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors, June 11–14, , St. Petersburg, Russia. Mathematical simulation of the distribution of minority charge carriers generated in a multilayer semiconducting structure by a wide electron beam. [26] J.Y. Lee, C. -H. Lee, et al.,"Atomically thin Heterojunction catalyst to reduce an overpotential in a photoelectrochemical cell", The 14th International Conference on Beam Injection Assessment of Microstructures in Semiconductors, @Seoul (June, 18') [Poster] [25] H.S. Kang and C. -H. Lee, "Wafer-scale Homogeneous Growth Monolayer Tungsten Dichalcogenides Using Metal-Organic Chemical .

Beam Injection Assessment of Microstructures in Semiconductors (xxx) yyy -yyyy. BIAMS - Versailles The 13th International Conference BIAMS continues a successful series of conferences which started in Meudon, France, in cal characterization of semiconductors by means of beam injection and related methods. Application ˙elds are. It is British and Irish Association for Mission Studies. British and Irish Association for Mission Studies listed as BIAMS. Beam Injection Assessment of Microstructures in Semiconductors (international workshop) BIAMS: British and Irish Association for Mission Studies. 12th international workshop on beam injection assessment of microstructures in semiconductors - biams 12 tsukuba/japan, june , The electron beam melting (EBM) system utilized in this study was the ARCAM EBM S This system, represented schematically in Fig. 1, allows solid parts to be directly manufactured from metal or alloy this study, we built simple test cylinders measuring cm in length and cm in diameter from Grade 5 Ti–6Al–4V powder having a nominal composition shown in Table by: